化工儀器網(wǎng)>產(chǎn)品展廳>半導(dǎo)體行業(yè)專用儀器>濕法工藝設(shè)備>濕法腐蝕/刻蝕設(shè)備>WS-1000 濕法刻蝕設(shè)備(Wet Station)美國(guó)Laurell
WS-1000 濕法刻蝕設(shè)備(Wet Station)美國(guó)Laurell
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- 公司名稱 邁可諾技術(shù)香港有限公司
- 品牌
- 型號(hào) WS-1000
- 產(chǎn)地 美國(guó)
- 廠商性質(zhì) 經(jīng)銷商
- 更新時(shí)間 2017/7/14 14:14:25
- 訪問(wèn)次數(shù) 2230
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勻膠機(jī),等離子清洗機(jī),光刻機(jī),折射率匹配液,顯微鏡浸鏡油,液壓機(jī),熱壓機(jī),加熱臺(tái),顯影機(jī),濕法腐蝕機(jī),
名稱:WS-1000濕法刻蝕設(shè)備Wet Station
產(chǎn)地:美國(guó)
品牌:Laurell
濕法設(shè)備Wet Station
濕法刻蝕設(shè)備特征:
l All white polypropylene construction
l Any Laurell Spin Processor(s) installed
l Easy-access Nitrogen&DI Spray guns
l Need a smaller size?-see our MINI
l 全白色聚丙烯構(gòu)造
l 可內(nèi)置任何Laurell公司的勻膠機(jī)(即旋涂?jī)x)
l 排放簡(jiǎn)便的入氮口和DI噴頭
l 如果需要更小尺寸——有微型濕法設(shè)備Wet Station供選擇
GENERAL INFORMATION
濕法刻蝕設(shè)備一般信息
The Laurell WS-1000 Series Spin-Process Stations allow a fully configuredtested module to be constructedshipped complete-requiring only the minimum of installation time. Easy to loadoperate-everything is in convenient reach to the operator.
Laurell公司的WS-1000系列旋轉(zhuǎn)處理濕法設(shè)備Wet Station可以被配置成測(cè)試模塊構(gòu)造,安裝簡(jiǎn)便,易于拆卸,更便于操作者控制。
Typical processes for the WS-1000 include, but are not limited to:
Typical processes for the WS-1000 include, but are not limited to:
典型的WS-1000濕法刻蝕設(shè)備Wet Station處理過(guò)程包括(但不限于):
l Coating
l Etching
l Developing-Aqueous/Solvent
l Cleaning-Aqueous/Solvent
l Yes, Sulfuric/Peroxide(insitu mixing)
l Yes, HBr
l Temperature-controlled Developing
l Rinsing/Drying
l 涂敷
l 蝕刻
l 開發(fā)-水/溶劑
l 清洗-水/溶劑
l 確認(rèn),硫酸/雙氧水(原樣混合)
l 確認(rèn),HBr
l 溫控開發(fā)
l 沖洗/烘干
Wet Station Features:
濕法刻蝕設(shè)備Wet Station特點(diǎn):
All polypropylene construction(Self-extinguishing available-see below)
Accommodates the installation of any Laurell spin processor
Perforated wet-deck(easily removable)
Wet plenum
Exhaust Plenum with gauge
Isolated component/drawer below for heaters, pumps, vessels…
全聚丙烯構(gòu)造(見下文的自滅火功能)
可兼容安裝任何Laurell 旋涂機(jī)
有排孔的濕隔層(易于拆除)
潮濕的空間
標(biāo)準(zhǔn)規(guī)格的排氣空間
被熱水器,水泵,容器等隔離的組件/容器
Wet StationOptions:
濕法刻蝕設(shè)備Wet Station選項(xiàng):
l Processor exhaust interlockcontrol(standard on some models)
l Heating&insitu material stirring
l Rinse to resistivity
l Drain diverter(s)
l Vacuum loading wand
l Wafer cassette stand
l Leak detection
l Light towers
l 排氣聯(lián)鎖控制處理器(一些型號(hào)是標(biāo)準(zhǔn)的)
l 加熱和原材料攪拌
l 抵抗力沖洗
l 排水轉(zhuǎn)向裝置
l 真空負(fù)荷棒
l 晶片盒座
l 檢漏
l 輕塔
Advanced materials available if required
濕法刻蝕設(shè)備Wet Station可以根據(jù)要求采用更高級(jí)的材料
Better
更好的濕法設(shè)備Wet Station
WS-1000-CP5-meets SEMI S93 specification for fire safety in clean room applications. CP5 meets UL94 V-O fire classification. It has an excellent babance of physical properties, chemical resistancefire safety.
WS-1000-CP5 濕法設(shè)備Wet Station符合SEMI S93標(biāo)準(zhǔn)應(yīng)用在消防安全和潔凈空間等領(lǐng)域。CP5符合UL94 V-O 火災(zāi)分類標(biāo)準(zhǔn)。它具有優(yōu)良的平衡的物理性能,耐化學(xué)藥品性和耐火性。
Best
*的濕法設(shè)備Wet Station
WS-1000-CP7-D-a flame retardant polypropylene formulation who’s flame retardant characteristics meet the most rigorous FMRC 4910 testing standards for most aspects of flame retardation, self-extinguishing characteristicsburn-through. This advanced material also meets or exceeds test standards for low smoke generationminimal toxic by-products.
WS-1000-CP7-D濕法設(shè)備Wet Station的材料阻燃特性符合zui嚴(yán)格的FMRC 4910測(cè)試標(biāo)準(zhǔn),滿足多方面條件下的難燃性,自熄特點(diǎn)和*燃燒。這種*的材料也達(dá)到或超過(guò)產(chǎn)生低煙和zui小毒副產(chǎn)品的檢測(cè)標(biāo)準(zhǔn)。