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化工儀器網>產品展廳>光學儀器及設備>光學實驗設備>其它光學實驗設備> X-Ray波帶片

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X-Ray波帶片

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X射線波帶片

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八帆儀器設備(上海)有限公司是創建于2017年,是集測試測量、研發、生產、銷售、服務為一體的高科技公司,亞太區總部位于中國上海。并在北京設立辦事處。八帆儀器設備(上海)有限公司致力于代理和應用*成熟的測試測量儀器及技術,應用于材料,物理,光學,化學,生物等領域。同時與國內外研發機構合作研究開發高精密測試測量技術及設備定制。有各*機構的技術支持,匯集有行業的精英技術團隊,負責產品及方案設計、生產制造、售前售后服務。

原子力顯微鏡,原子力拉曼,有機合成質譜儀,制備色譜,納米紅外光譜儀,掃描近場光學顯微鏡,電鏡下原子力,微米級3D打印機,

應用領域 綜合

X-Ray波帶片高質量的X射線光學系統,具有經過驗證的分辨率、效率和可靠性、低成本,適用于ptychography、STXM、TXM和相位對比成像的軟X射線和硬X射線。

X-Ray波帶片優勢:

 利用不同的金屬(金或鎳)可以提高一系列能量的效率。該圖為從ANT波帶片軟件生成的圖像。
 高分辨率波帶片可在大范圍的能量范圍內提供z高的分辨率和效率。18 nm(Δr)分辨率的波帶片提供高分辨率,水窗效率高于20%。18 nm Au FZP圖像,直徑270μm,中心光闌設計。
 Applied Nanotool的波帶片可用于各種應用,包括大直徑的ptychography和幾毫米的<1 nm縫合誤差。直徑為0.85毫米的波帶片圖像
 高相位對比成像,適用于分辨率為50 nm及以下的硬X射線應用。波帶片的均勻性是高相位襯度成像的關鍵組成部份。

軟X-Ray指標

低于5keV(<0.25nm)的X射線通常被歸類為軟X射線,該射線比高能X射線更容易被吸收。通常,波帶片不需要相同的厚度效率,并且允許更高分辨率成像。軟/細X射線的一系列波帶板選項可滿足特定要求。
Device Outer Zone Width ΔR n(nm) Thickness (µm) Outer Diameter (µm) (# of zones) E/ΔE Limit ~ Focal Length (µm) Estimated Lead Time
NZP-50um-12nm 12 0.05 + 0.01 50 1059 144 Please Contact
NZP-65um-15nm 15 65 1096 235
SZP?90um?15nm 15 <0.1 90 1514 325 2-3
SZP?120um?15nm 120 2019 433
SZP?200um?18nm 18 <0.15 200 2797 868 In Stock
SZP?270um?18nm 270 3775 1172
SZP?320um?18nm 320 4473 1389
SZP-200um-25nm 25 <0.24 200 2007 1207 In Stock
SZP?250um?25nm 250 2509 1510
SZP-300um-25nm 300 3010 1811
SZP-360um-25nm 360 3612 2173
TZP?160um?50nm 50 <0.75 160 801 1934 2 – 3
TZP?280um?50nm 280 1401 3384
TZP?750um?200nm 200 <0.75 750 938 36292 1 – 3
TZP?1250um?200nm 1250 1563 60487
 *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software.

硬X-Ray指標

高于5-10keV的X射線從柔弱轉變為硬X射線,在那里它們能夠更好地穿透樣品以提供更好的成像。硬X射線菲涅耳波帶片需要高縱橫比功能,以便為5 keV以上的能量提供足夠的效率和分辨率。我們目前的光學系統可根據所需的能量為亞25 nm – 100 nm成像提供超高分辨率。堆疊硬X射線(通過雙重處理或芯片對準)可以顯著提高我們設備的效率。 硬X射線的波帶片選項范圍可用于特定要求。
Device Outer Zone Width ΔR n(nm) Thickness (µm) Outer Diameter (µm) (# of zones) E/ΔE Limit Energy Range (keV) Estimated Lead Time (months)
HZP-50-25nm 25 >0.65 50 500 1.5 to 10 2 – 3
HZP-75-25nm 75 750 2 – 3
HZP?100um?42.5nm  42.5 >0.8 100 588 2 to 12 2 – 3
HZP?85um?50nm 50 >0.9 85 425 2  to 12 2 – 3
HZPX?85um?50nm >1.7 5.5 to 20 4 – 6
HZP?180um?50nm >0.9 180  900  2 to 12 2 – 3
HZP?550um?50nm >0.9 550 2750 2 to 12 2 – 3
HZPX?550um?50nm >1.5 5.5 to 20 4 – 6
HZP-400um-100nm  100 >1.2 400 1000  2.5 to 8 2 – 3
HZPX?400um?100nm >2.6 8 to 30 4 – 6
HZP?400um?120nm  120 >1.5 400 834  5 to 25 2 – 3
HZPX?400um?120nm >2.6  8 to 30 4 – 5
HZP?750um?200nm  200 >2.2 750 938  7 to 20 3 – 4
HZPX?750um?200nm  200 >3.6  12 to 50 4 – 5
 *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. All zone plate diameters can be customized for specific setups. Standard frame sizes are 3 mm x 3 mm with SiN membranes (100 nm).

Oxide Interlock process for Hard X-Ray Optics

Zone plate efficiency for binary zone plates requires high aspect ratio structures which can survive high flux imaging systems. The “Oxide Interlock” option creates small interconnecting channels between metal zone of silicon dioxide which is transparent to hard X-rays and does not swell or distort, even when not under vacuum. These have been shown to significantly increase the zone plate efficiency and lifetime.
 Oxide Interlock process with silicon dioxide links between the gold zones, improving performance and lifetime of the zone plate optics. This comes standard on all hard X-ray optics. The silicon dioxide is highly transparent for hard X-rays.

中心光闌

中心光闌和外光闌選項可以顯著改善波帶板成像,降低光學器件的0次級并提高其使用壽命。各種厚度可達3μm的芯片可用或大于10μm作為單獨的芯片。 高分辨率18 nm外區菲涅耳波帶片頂部電鍍4μm厚中心止點  4 um thick central stop electroplated on top of Fresnel zone plate with high resolution 18 nm outer zones

Custom Designs and Frame Size

Custom designs and frame sizes can be developed for specific applications. We are able to fabricate devices down to 0.1 mm and below. Our standard frame sizes are 5 mm x 5 mm and membrane thickness can be down to 50 nm while the 100 nm thickness is ideal for energies above 5 keV. We also offer silicon carbide membranes for those requiring long-lifetime membranes.
 Custom silicon nitride, silicon carbide or silicon membranes down to 0.9 mm half dimensions. Image above showing 1 cm x 1 cm (top), 5 mm x 5 mm (bottom left) and 0.9 mm x 5 mm chips.

XY Stage for Zone Plates/Central Stop Alignment

Our custom XY stage allows micro-scale alignment of a central stop and zone plate and also allows for a possible blast-shield to be mounted.  XY micrometer scale stage holder for central stop and zone plate alignment with blast shield

<iframe allowfullscreen="true" frameborder="0" height="480" mozallowfullscreen="true" src="https://myhub.autodesk360.com/ue2c055fb/shares/public/SHabee1QT1a327cf2b7a3d447e23386eab43?mode=embed" style="box-sizing: border-box; margin: 0px; padding: 0px; border-width: 0px; border-style: initial; font-style: inherit; font-variant: inherit; font-weight: inherit; font-stretch: inherit; font-size: inherit; line-height: inherit; font-family: inherit;" webkitallowfullscreen="true" width="640">


波帶片計算器

Applied Nanotools offers a free online zone plate calculating theoretical efficiencies and for calculating Fresnel zone plates parameters. Please see this link to visit the webpage: Zone Plate Calculator. For the legacy software please download here (note, this version is being replaced with the new website version).

優勢

 利用不同的金屬(金或鎳)可以提高一系列能量的效率。該圖為從ANT波帶片軟件生成的圖像。
 高分辨率波帶片可在大范圍的能量范圍內提供高的分辨率和效率。18 nm(Δr)分辨率的波帶片提供高分辨率,水窗效率高于20%。18 nm Au FZP圖像,直徑270μm,中心光闌設計。
 Applied Nanotool的波帶片可用于各種應用,包括大直徑的ptychography和幾毫米的<1 nm縫合誤差。直徑為0.85毫米的波帶片圖像
 高相位對比成像,適用于分辨率為50 nm及以下的硬X射線應用。波帶片的均勻性是高相位襯度成像的關鍵組成部份。

軟X-Ray指標

低于5keV(<0.25nm)的X射線通常被歸類為軟X射線,該射線比高能X射線更容易被吸收。通常,波帶片不需要相同的厚度效率,并且允許更高分辨率成像。軟/細X射線的一系列波帶板選項可滿足特定要求。
Device Outer Zone Width ΔR n(nm) Thickness (µm) Outer Diameter (µm) (# of zones) E/ΔE Limit ~ Focal Length (µm) Estimated Lead Time
NZP-50um-12nm 12 0.05 + 0.01 50 1059 144 Please Contact
NZP-65um-15nm 15 65 1096 235
SZP?90um?15nm 15 <0.1 90 1514 325 2-3
SZP?120um?15nm 120 2019 433
SZP?200um?18nm 18 <0.15 200 2797 868 In Stock
SZP?270um?18nm 270 3775 1172
SZP?320um?18nm 320 4473 1389
SZP-200um-25nm 25 <0.24 200 2007 1207 In Stock
SZP?250um?25nm 250 2509 1510
SZP-300um-25nm 300 3010 1811
SZP-360um-25nm 360 3612 2173
TZP?160um?50nm 50 <0.75 160 801 1934 2 – 3
TZP?280um?50nm 280 1401 3384
TZP?750um?200nm 200 <0.75 750 938 36292 1 – 3
TZP?1250um?200nm 1250 1563 60487
 *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software.

硬X-Ray指標

高于5-10keV的X射線從柔弱轉變為硬X射線,在那里它們能夠更好地穿透樣品以提供更好的成像。硬X射線菲涅耳波帶片需要高縱橫比功能,以便為5 keV以上的能量提供足夠的效率和分辨率。我們目前的光學系統可根據所需的能量為亞25 nm – 100 nm成像提供超高分辨率。堆疊硬X射線(通過雙重處理或芯片對準)可以顯著提高我們設備的效率。 硬X射線的波帶片選項范圍可用于特定要求。
Device Outer Zone Width ΔR n(nm) Thickness (µm) Outer Diameter (µm) (# of zones) E/ΔE Limit Energy Range (keV) Estimated Lead Time (months)
HZP-50-25nm 25 >0.65 50 500 1.5 to 10 2 – 3
HZP-75-25nm 75 750 2 – 3
HZP?100um?42.5nm  42.5 >0.8 100 588 2 to 12 2 – 3
HZP?85um?50nm 50 >0.9 85 425 2  to 12 2 – 3
HZPX?85um?50nm >1.7 5.5 to 20 4 – 6
HZP?180um?50nm >0.9 180  900  2 to 12 2 – 3
HZP?550um?50nm >0.9 550 2750 2 to 12 2 – 3
HZPX?550um?50nm >1.5 5.5 to 20 4 – 6
HZP-400um-100nm  100 >1.2 400 1000  2.5 to 8 2 – 3
HZPX?400um?100nm >2.6 8 to 30 4 – 6
HZP?400um?120nm  120 >1.5 400 834  5 to 25 2 – 3
HZPX?400um?120nm >2.6  8 to 30 4 – 5
HZP?750um?200nm  200 >2.2 750 938  7 to 20 3 – 4
HZPX?750um?200nm  200 >3.6  12 to 50 4 – 5
 *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. All zone plate diameters can be customized for specific setups. Standard frame sizes are 3 mm x 3 mm with SiN membranes (100 nm).

Oxide Interlock process for Hard X-Ray Optics

Zone plate efficiency for binary zone plates requires high aspect ratio structures which can survive high flux imaging systems. The “Oxide Interlock” option creates small interconnecting channels between metal zone of silicon dioxide which is transparent to hard X-rays and does not swell or distort, even when not under vacuum. These have been shown to significantly increase the zone plate efficiency and lifetime.
 Oxide Interlock process with silicon dioxide links between the gold zones, improving performance and lifetime of the zone plate optics. This comes standard on all hard X-ray optics. The silicon dioxide is highly transparent for hard X-rays.

中心光闌

中心光闌和外光闌選項可以顯著改善波帶板成像,降低光學器件的0次級并提高其使用壽命。各種厚度可達3μm的芯片可用或大于10μm作為單獨的芯片。 高分辨率18 nm外區菲涅耳波帶片頂部電鍍4μm厚中心止點  4 um thick central stop electroplated on top of Fresnel zone plate with high resolution 18 nm outer zones

Custom Designs and Frame Size

Custom designs and frame sizes can be developed for specific applications. We are able to fabricate devices down to 0.1 mm and below. Our standard frame sizes are 5 mm x 5 mm and membrane thickness can be down to 50 nm while the 100 nm thickness is ideal for energies above 5 keV. We also offer silicon carbide membranes for those requiring long-lifetime membranes.
 Custom silicon nitride, silicon carbide or silicon membranes down to 0.9 mm half dimensions. Image above showing 1 cm x 1 cm (top), 5 mm x 5 mm (bottom left) and 0.9 mm x 5 mm chips.

XY Stage for Zone Plates/Central Stop Alignment

Our custom XY stage allows micro-scale alignment of a central stop and zone plate and also allows for a possible blast-shield to be mounted.  XY micrometer scale stage holder for central stop and zone plate alignment with blast shield

<iframe allowfullscreen="true" frameborder="0" height="480" mozallowfullscreen="true" src="https://myhub.autodesk360.com/ue2c055fb/shares/public/SHabee1QT1a327cf2b7a3d447e23386eab43?mode=embed" style="box-sizing: border-box; margin: 0px; padding: 0px; border-width: 0px; border-style: initial; font-style: inherit; font-variant: inherit; font-weight: inherit; font-stretch: inherit; font-size: inherit; line-height: inherit; font-family: inherit;" webkitallowfullscreen="true" width="640">


波帶片計算器

Applied Nanotools offers a free online zone plate calculating theoretical efficiencies and for calculating Fresnel zone plates parameters. Please see this link to visit the webpage: Zone Plate Calculator. For the legacy software please download here (note, this version is being replaced with the new website version).

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